The stoichiometry of metal assisted etching (MAE) of Si in V2O5 + HF and HOOH + HF solutions

Authors

Kurt W. Kolasinski, West Chester University of PennsylvaniaFollow
William B. Barclay, West Chester University of Pennsylvania
Yu Sun, University of Connecticut - Storrs
Mark Aindow, University of Connecticut - Storrs

Document Type

Article

Publication Date

2-6-2015

Publication Title

Electrochimica Acta

ISSN

0013-4686

Publisher

Elsevier

First Page

219

Last Page

228

DOI

10.1016/j.electacta.2015.01.162

Recommended Citation

Kolasinski, K. W., Barclay, W. B., Sun, Y., & Aindow, M. (2015). The stoichiometry of metal assisted etching (MAE) of Si in V2O5 + HF and HOOH + HF solutions. Electrochimica Acta, 219-228. http://dx.doi.org/10.1016/j.electacta.2015.01.162